系列文档

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  1 Non-Silicon MOSFET Technology：A Long Time Coming.pdf 5页
  最爱~搬盗踢
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  2016/12/18 9:25:49
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  2 Properties and Trade-Offs of Compound Semiconductor MOSFETs.pdf 5页
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  2016/12/18 9:25:50
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  3 Device Physics and Performance Potential of III-V Field-Effect Transistors.pdf 5页
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  2016/12/18 9:25:51
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  4 Theory of HfO2-Based High-k Dielectric Gate Stacks.pdf 5页
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  2016/12/18 9:25:52
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  5 Density Functional Theory Simulations of High-k Oxides on III-V SemiconductorsDensity Functional Theory Simulations of High-k Oxides on III-V Semiconductors.pdf 5页
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  2016/12/18 9:25:53
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  6 Interfacial Chemistry of Oxides on III-V Compound Semiconductors.pdf 5页
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  2016/12/18 9:25:54
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  7 Atomic-Layer Deposited High-k III-V Metal-Oxide-Semiconductor Devices and Correlated Empirical Model.pdf 5页
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  2016/12/18 9:25:55
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  8 Materials and Technologies for III-V MOSFETs.pdf 5页
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  2016/12/18 9:25:56
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  9 InGaAs, Ge, and GaN Metal-Oxide-Semiconductor Devices with High-k Dielectrics for Science and Technology Beyond Si CMOS.pdf 5页
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  2016/12/18 9:25:57
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  10 Sub-100 nm Gate III-V MOSFET for Digital Applications.pdf 5页
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  2016/12/18 9:25:58
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  11 Electrical and Material Characteristics of Hafnium Oxide with Silicon Interface Passivation on III-V Substrate for Future Scaled CMOS Technology.pdf 5页
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  2016/12/18 9:25:59
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  12 p-type Channel Field-Effect Transistors.pdf 5页
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  2016/12/18 9:26:00
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  13 Insulated Gate Nitride-Based Field Effect Transistors.pdf 5页
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  2016/12/18 9:26:01
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  14 Technology Circuit Co-Design for III-V FETs.pdf 5页
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  2016/12/18 9:26:02
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  Back matter.pdf 5页
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  2016/12/18 9:26:03
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  Front matter.pdf 5页
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  2016/12/18 9:26:03